HelsinkiALD - a unique combination of basic research and industrial collaboration

The HelsinkiALD group, led by Professor Mikko Ritala and Associate professor Matti Putkonen, is doing research in the field of inorganic materials chemistry. Our main research topic is thin films and Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.
@HelsinkiALD

Stats from the last year added: #ALDep publications goin up again! 1740 in 2020, in 2000 there were 112. Those days… twitter.com/i/web/status/1…

Let there be light! Cu photo-ALD selectively on Ta2O5 vs. Al2O&SiO2. onlinelibrary.wiley.com/doi/10.1002/ad… #HelsinkiChemistrytwitter.com/i/web/status/1…

Check it out: "experimental ...work at the very core of chemical sciences: reaction kinetics and dynamics, i.e. und… twitter.com/i/web/status/1…

ChemistryNews, the newsletter of chemistry department @HelsinkiUni @KumpulaScience is out of press!… twitter.com/i/web/status/1…