Thin films and nanostructured materials
The HelsinkiALD group, led by Professor Mikko Ritala and Associate professor Matti Putkonen, is doing research in the field of inorganic materials chemistry. Our main research topic is thin films and Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.
ALD cell ready to run in Max IV synchrotron
A new ALD cell has been installed and taken into use in Max IV laboratory for in situ Ambient Pressure X-ray Photoelectron Spectroscopy (APXPS)...
Professor Mikko Ritala, inventor of extraordinary coatings, awarded a prize
The Magnus Ehrnrooth Foundation’s Award in Chemistry in 2020 has been granted to Professor Mikko Ritala, who heads the atomic layer deposition...