Thin films and nanostructured materials
The HelsinkiALD group, led by Professor Mikko Ritala and Associate professor Matti Putkonen, is doing research in the field of inorganic materials chemistry. Our main research topic is Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.
ALD research takes a leap forward: now we can study what happens at the surface level in ALD
New research equipment acquired by the ALD laboratory at the University of Helsinki is opening up new dimensions. The new instrument connects...
Atomic layer deposition as a key enabler of scalable and stable perovskite solar cells
Solar cells are an essential part of sustainable electricity production. New solar cell technologies are needed to further increase the power...