HelsinkiALD - a unique combination of basic research and industrial collaboration

The HelsinkiALD group, led by Professor Mikko Ritala and Associate professor Matti Putkonen, is doing research in the field of inorganic materials chemistry. Our main research topic is Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.
@HelsinkiALD

Honored to host today in the ALD lab the highest command chain of our university: the board, rector & vice-rectors,… twitter.com/i/web/status/1…

Our alumnis working there too, likely more in the future. twitter.com/MikkoRitala/st…

Today I have setup a deposition experiment numbered 8000 on an F120 ASMM reactor that is named "K" in our lab. AFAI… twitter.com/i/web/status/1…

Jani's samples last for long: Osteoblast Attachment on Titanium Coated with Hydroxyapatite by Atomic Layer Deposit… twitter.com/i/web/status/1…